This International Standard provides a method for determining the volume flowrate of fluorinated compounds (FCs) greenhouse gases such as CF4, NF3, SF6, and N2O, which are used in the semiconductor and display processes such as etching, chemical vapour deposition (CVD), etc. It uses two measuring equipment, including quadrupole mass spectrometer (QMS) to determine the total volume flow rate of exhaust gas from the process and Fourier-transform infrared spectroscopy (FTIR) for determining the concentration of FCs and N2O in the duct.
Registration number (WIID)
84634
Scope
This International Standard provides a method for determining the volume flowrate of fluorinated compounds (FCs) greenhouse gases such as CF4, NF3, SF6, and N2O, which are used in the semiconductor and display processes such as etching, chemical vapour deposition (CVD), etc. It uses two measuring equipment, including quadrupole mass spectrometer (QMS) to determine the total volume flow rate of exhaust gas from the process and Fourier-transform infrared spectroscopy (FTIR) for determining the concentration of FCs and N2O in the duct.
