Registration number (WIID)Project No.TitleStatus
80308ISO/TS 4767:2024Plastics — Method of exposure to electrodeless plasma radiation sourcesStandarts spēkā
80307ISO 4765:2022Chemically-induced ultra-weak photon emission (UPE) — Measurement as an analysis method of degradation of polymeric materialStandarts spēkā
81635ISO 4892-2:2013/Amd 1:2021Plastics — Methods of exposure to laboratory light sources — Part 2: Xenon-arc lamps — Amendment 1: Classification of daylight filtersStandarts spēkā
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