ISO/TC 146/SC 1
| Registration number (WIID) | Project No. | Title | Status |
|---|---|---|---|
| 85573 | ISO/NP 16538 | Stationary source emissions — Determination of volume flowrate and concentration of fluorinated compounds (FCs) and N2O in ducts of semiconductor and display processes | Izstrādē |
| 85707 | ISO/FDIS 16911-1 | Stationary source emissions — Manual and automatic determination of velocity and volume flow rate of waste gas in ducts — Part 1: Manual reference method | Izstrādē |
| 74956 | ISO/NP 19694-7 | Stationary source emissions — Determination of greenhouse gas (GHG) emissions in energy-intensive industries — Part 7: Semiconductor and display industries | Izstrādē |
| 92163 | ISO/CD 15713 | Stationary source emissions — Sampling and determination of gaseous fluoride content | Izstrādē |
| 46310 | ISO/WD 23210-2 | Stationary source emissions — Determination of PM10/PM2,5 mass concentration in flue gas — Part 2: Measurement at high concentrations by use of cyclones | Izstrādē |
| 85708 | ISO/AWI 16911-2 | Stationary source emissions — Manual and automatic determination of velocity and volume flow rate in ducts — Part 2: Automated measuring systems | Izstrādē |
| 66041 | ISO/DIS 19694-4 | Stationary source emissions — Determination of greenhouse gas (GHG) emissions in energy-intensive industries — Part 4: Aluminium industry | Izstrādē |
| 19302 | ISO/CD 11338-1 | Stationary source emissions — Determination of mass concentration of polycyclic aromatic hydrocarbons — Part 1: Sampling | Izstrādē |
| 74955 | ISO/NP 23227 | Stationary source emissions — Measurement method for volumetric flow of Non-CO2 GHG(CF4, NF3, SF6, N2O) in semiconductor and display industries | Izstrādē |
| 78185 | ISO/NP 10849 | Stationary source emissions — Determination of the mass concentration of nitrogen oxides — Performance characteristics of automated measuring systems | Izstrādē |
Displaying 61-70 of 83 results.