71.040.40 Chemical analysis

Chemical analysis of refractories containing alumina, zirconia, and silica - Refractories containing 5 percent to 45 percent of ZrO<(Index)2> (alternative to the X-ray fluorescence method) - Part 3: Flame atomic absorption spectrophotometry (FAAS) and inductively coupled plasma emission spectrometry (ICP -AES)

Surface chemical analysis -- Scanning probe microscopy -- Procedure for the determination of elastic moduli for compliant materials using atomic force microscope and the two-point JKR method

Surface chemical analysis X-ray photoelectron and Auger electron spectrometers Linearity of intensity scale

Surface chemical analysis Information format for static secondary-ion mass spectrometry

Surface chemical analysis Depth profiling Measurement of sputtering rate: mesh-replica method using a mechanical stylus profilometer

Surface chemical analysis Secondary ion mass spectrometry Method for determining yield volume in argon cluster sputter depth profiling of organic materials

Surface chemical analysis -- Near real-time information from the X-ray photoelectron spectroscopy survey scan -- Rules for identification of, and correction for, surface contamination by carbon-containing compounds

Surface chemical analysis — Secondary ion mass spectrometry — Method for the measurement of mass resolution in SIMS

Surface chemical analysis — Measurement of lateral and axial resolutions of a Raman microscope

Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

Surface chemical analysis — Atomic force microscopy — Guideline for restoration procedure for atomic force microscopy images dilated by finite probe size

Surface chemical analysis Secondary-ion mass spectrometry Method for depth calibration for silicon using multiple delta-layer reference materials