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This document specifies spectroscopic ellipsometry for the determination of optical properties
(refractive index n and extinction coefficient k) and the optical classification of different types of
amorphous carbon films within the n-k plane.
It is applicable to amorphous carbon films deposited by ionized evaporation, sputtering, arc deposition, plasma-assisted chemical vapour deposition, hot filament techniques and others.
It does not apply to carbon films modified with metals or silicon, amorphous carbon films that have a gradient of composition/property in the thickness, paints and varnishes.
Reģistrācijas numurs (WIID)
75784
Darbības sfēra
This document specifies spectroscopic ellipsometry for the determination of optical properties
(refractive index n and extinction coefficient k) and the optical classification of different types of
amorphous carbon films within the n-k plane.
It is applicable to amorphous carbon films deposited by ionized evaporation, sputtering, arc deposition, plasma-assisted chemical vapour deposition, hot filament techniques and others.
It does not apply to carbon films modified with metals or silicon, amorphous carbon films that have a gradient of composition/property in the thickness, paints and varnishes.
