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<p>ISO 51818:20090 applies to dosimetric procedures to determine the performance of low-energy (300 keV or less) single-gap electron-beam radiation processing facilities.</p>
<p>Other practices and procedures related to facility characterization, process qualification and routine processing are also discussed.</p>
<p>The electron-energy range covered in ISO 51538:2009 is from 80 keV to 300 keV. Such electron beams can be generated by single-gap self-contained thermal filament or plasma-source accelerators.</p>
Reģistrācijas numurs (WIID)
38105
Darbības sfēra
<p>ISO 51818:20090 applies to dosimetric procedures to determine the performance of low-energy (300 keV or less) single-gap electron-beam radiation processing facilities.</p>
<p>Other practices and procedures related to facility characterization, process qualification and routine processing are also discussed.</p>
<p>The electron-energy range covered in ISO 51538:2009 is from 80 keV to 300 keV. Such electron beams can be generated by single-gap self-contained thermal filament or plasma-source accelerators.</p>
