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<p>This document specifies spectroscopic ellipsometry for the determination of optical properties (refractive index <em>n</em> and extinction coefficient <em>k</em>) and the optical classification of different types of amorphous carbon films within the <em>n</em>-<em>k</em> plane.</p>
<p>It is applicable to amorphous carbon films deposited by ionized evaporation, sputtering, arc deposition, plasma-assisted chemical vapour deposition, hot filament techniques and others.</p>
<p>It does not apply to carbon films modified with metals or silicon, amorphous carbon films that have a gradient of composition/property in the thickness, paints and varnishes.</p>
Reģistrācijas numurs (WIID)
74875
Darbības sfēra
<p>This document specifies spectroscopic ellipsometry for the determination of optical properties (refractive index <em>n</em> and extinction coefficient <em>k</em>) and the optical classification of different types of amorphous carbon films within the <em>n</em>-<em>k</em> plane.</p>
<p>It is applicable to amorphous carbon films deposited by ionized evaporation, sputtering, arc deposition, plasma-assisted chemical vapour deposition, hot filament techniques and others.</p>
<p>It does not apply to carbon films modified with metals or silicon, amorphous carbon films that have a gradient of composition/property in the thickness, paints and varnishes.</p>
