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This document specifies the requirements and guidelines for applying atomic layer deposition (ALD) coatings of alumina on solar cells. It covers the entire ALD coating process, including substrate preparation, precursor selection, deposition parameters, film characterization, and quality control. It applies to manufacturers, researchers, and regulatory bodies involved in the development and production of silicon solar cells with ALD alumina coatings. It ensures consistent and high-quality deposition, improving the performance and stability of silicon solar cells.
Reģistrācijas numurs (WIID)
89101
Darbības sfēra
This document specifies the requirements and guidelines for applying atomic layer deposition (ALD) coatings of alumina on solar cells. It covers the entire ALD coating process, including substrate preparation, precursor selection, deposition parameters, film characterization, and quality control. It applies to manufacturers, researchers, and regulatory bodies involved in the development and production of silicon solar cells with ALD alumina coatings. It ensures consistent and high-quality deposition, improving the performance and stability of silicon solar cells.
