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<p>This document specifies a test method for determining thermal expansion coefficient up to 2 300 K and the residual stress of chemical vapour deposition (CVD) ceramic coatings (thickness > 0,03 mm) at room temperature. Procedures for test piece preparation, test modes, heat rate, data collection, property calculations and reporting procedures are given.</p>
<p>This document applies to CVD ceramic coatings on metal or ceramic substrates. This test method can be used for material research, quality control, characterization and design data-generation purposes.</p>
Reģistrācijas numurs (WIID)
75634
Darbības sfēra
<p>This document specifies a test method for determining thermal expansion coefficient up to 2 300 K and the residual stress of chemical vapour deposition (CVD) ceramic coatings (thickness > 0,03 mm) at room temperature. Procedures for test piece preparation, test modes, heat rate, data collection, property calculations and reporting procedures are given.</p>
<p>This document applies to CVD ceramic coatings on metal or ceramic substrates. This test method can be used for material research, quality control, characterization and design data-generation purposes.</p>
