71.040.40 Ķīmiskās analīzes
Attēlo no 85. līdz 96. no pavisam 250 ieraksta(-iem).
ISO/TS 14167:2003
tehniskā specifikācija (TS)
EN
Gas analysis General quality assurance aspects in the use of calibration gas mixtures - Guidelines
68.85 €
ISO/TR 14187:2011
tehniskais ziņojums (TR)
EN
Surface chemical analysis Characterization of nanostructured materials
68.85 €
ISO/TR 14187:2020
tehniskais ziņojums (TR)
EN
Surface chemical analysis -- Characterization of nanostructured materials
187.48 €
ISO 14237:2010
standarts
EN
Surface chemical analysis Secondary-ion mass spectrometry Determination of boron atomic concentration in silicon using uniformly doped materials
139.82 €
ISO 14606:2000
standarts
EN
Surface chemical analysis Sputter depth profiling Optimization using layered systems as reference materials
68.85 €
ISO 14606:2015
standarts
EN
Surface chemical analysis Sputter depth profiling Optimization using layered systems as reference materials
68.85 €
ISO 14606:2022
standarts
EN
Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
103.80 €
ISO 14701:2011
standarts
EN
Surface chemical analysis X-ray photoelectron spectroscopy Measurement of silicon oxide thickness
68.85 €
ISO 14701:2018
standarts
EN
Surface chemical analysis X-ray photoelectron spectroscopy Measurement of silicon oxide thickness
103.80 €
ISO 14706:2000
standarts
EN
Surface chemical analysis Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
68.85 €
ISO 14706:2014
standarts
EN
Surface chemical analysis Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
139.82 €
ISO 14707:2000
standarts
EN
Surface chemical analysis Glow discharge optical emission spectrometry (GD-OES) Introduction to use
68.85 €